@Article{MorelhãoKyNeFoRaAb:2018:HyReMu,
author = "Morelh{\~a}o, S{\'e}rgio L. and Kycia, Stefan and Netzke, Samuel
and Fornari, Celso Israel and Rappl, Paulo Henrique de Oliveira
and Abramof, Eduardo",
affiliation = "{University of Guelph} and {University of Guelph} and {University
of Guelph} and {Instituto Nacional de Pesquisas Espaciais (INPE)}
and {Instituto Nacional de Pesquisas Espaciais (INPE)} and
{Instituto Nacional de Pesquisas Espaciais (INPE)}",
title = "Hybrid reflections from multiple x-ray scattering in epitaxial
bismuth telluride topological insulator films",
journal = "Applied Physics Letters",
year = "2018",
volume = "112",
number = "10",
pages = "e101903",
month = "Mar.",
abstract = "Epitaxial films of bismuth telluride topological insulators have
received increasing attention due to their potential applications
in spintronic and quantum computation. One of the most important
properties of epitaxial films is the presence of interface defects
due to the lateral lattice mismatch since electrically active
defects can drastically compromise device performance. By
describing hybrid reflections in hexagonal bismuth telluride films
on cubic substrates, in-plane lattice mismatches were
characterized with accuracy at least 20 times better than using
other X-ray diffraction methods, providing clear evidence of
0.007% lateral lattice mismatch, consistent with stress relaxation
associated with van der Waals gaps in the film structure.",
doi = "10.1063/1.5020375",
url = "http://dx.doi.org/10.1063/1.5020375",
issn = "0003-6951",
label = "self-archiving-INPE-MCTIC-GOV-BR",
language = "en",
targetfile = "morelhao_hybrid.pdf",
urlaccessdate = "27 abr. 2024"
}